Phd for r&d cmos integration in dresden
Dresden
As a PhD candidate in R&D CMOS Integration, you will conduct advanced research on the development and optimization of ferroelectric HfO₂-based devicesfor next‑generation memory and AI applications. Core Research Topics Ferroelectric HfO₂ Devices (FeFET / FeCAP) - Optimization of HfO₂ thin films for stable ferroelectric behavior and [...]